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o InternationaL Email Bulletin on: o
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EMAIL MESSAGE 05-12-93
...............................................................................
E-MRS 1994 SPRING MEETING
to be held at
Council of Europe/European Parliament
Strasbourg, France
May 24-27, 1994
>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>
CONFERENCE PROGRAMME
SYMPOSIUM B PHOTON-ASSISTED PROCESSING OF SURFACES AND THIN FILMS
SYMPOSIUM C Photorefractive Materials: Growth and Doping, Optical
and Electrical Characteristics, Charge Transfer
Processes and Space Charge Field Effects,
Applications.
SYMPOSIUM D Organic Materials for Electronics: Polymer Interfaces
with Metals and Semiconductors
SYMPOSIUM E High Temperature Electronics: Materials, Devices and
Applications
SYMPOSIUM F Porous Silicon and Related Materials
SYMPOSIUM G First European Material Research Society Workshop on
Advanced Materials Education
SYMPOSIUM H New Materials for the Conservation of Cultural
Heritage
...............................................................................
SYMPOSIUM B: Photon-Assisted Processing of Surfaces and Thin Films
The steadily improving performance of existing lasers and lamps
and the development of new photon sources greatly stimulates
research into their possible use in an ever broadening range of
applications. This symposium covers all aspects of the effects of
photons from these sources on etching, deposition, doping,
modification and patterning of surfaces and thin films. Investi-
gations of the basic mechanisms, kinetics and modelling of the
physical and chemical processes involved, as well as studies of
the applications and the characterization of the products are
included. Specific topics comprise:
Pulsed laser ablation of materials, both for patterning
purposes as well as for the deposition of single and multi-
layer thin films of semiconductors, photoconductors,
dielectrics, metals, etc.
Laser, or lamp-assisted chemical vapour deposition of con-
tinuous and patterned thin films, atomic layer epitaxy.
Focused laser beam-induced desorption, ablation, deposition or
modification of thin films for marking, recording and mask
production or repair.
Resistless projection patterning of thin films, selective area
doping and deposition.
Continuous or patterned modification of surface films for the
production of metallisation, wear resistance, isolation,
adherence, seeding, etc.
Laser, or lamp-anealing of thin films.
In-situ process and thin film diagnostics.
Scientific Committee:
C. Afonso, CSIC, Inst. Optica, Spain
P. Baeri, University of Catania, Italy.
J.O. Carlsson, Uppsala University, Sweden.
J.M.D. Coey, Trinity College, Dublin, Ireland.
J.J. Dubowski, National Research Council, Canada.
P. Dyer, University of Hull, UK.
J.G. Eden, Univ. Illinois Urbana-Champaign, USA.
M. Hanabusa, Toyohashi Univ. Technology, Japan.
E.W. Kreutz, RWTH Aachen, Germany.
R. Larciprete, ENEA, INN/FIS, Italy.
L. Laude, University de Mons, Hainaut, Belgium.
S. Lepavuori, University of Oulu, Finland.
W. Marine, Facultedes Sciences de Luminy, France.
S.B. Ogale, University of Poona, India.
A. Peled, CTEH, aff. Tel-Aviv University, Israel.
J. Perrier, University Paris VI et VII, France.
T. Szorenyi, Hungarian Academy Sciences, Hungary.
Chairpersons:
Dr. U.K.P. Biermann Prof. P. Hess
Philips Research Labs Phys. Chem. Inst.
Bldg. WZ, P.O. Box 80000 Ruprecht-Karls-Universitat
5600JA Eindohoven Im Neuenheimer Feld 253
The Netherlands. 69120 Heidelberg, Germany.
Tel: (+31)40 74 2430 Tel: (+49) 6221 565205
Fax: (+31)40 74 2081 Fax: (+49) 6221 563199
EMail: B95 at VM.URZ.UNI-HEIDELBERG.DE
Dr. J. Dieleman
DSA Consultants
Geranium laan 11
5582 GD Waalre
The Netherlands
Tel: (+31) 49 04 13682
Fax: (+31) 40 74 2081
FOR PREREGISTRATION FORMS AND ABSTRACT SUBMISSION PLEASE CONTACT
ONE OF THE CHAIRPERSONS ABOVE.
Papers are solicited in the areas described earlier. Abstracts
(confined to an area of 17.5 cm wide by 23 cm long) should be
submitted to one of the chairpersons. Papers will be selected by
the scientific committee of each symposium.
DEADLINE FOR ABSTRACT SUBMISSION: MARCH 10, 1994
Authors will be notified of acceptance and mode of presentation of
their papers by April 10, 1994.
PROCEEDINGS
Full length papers will be published in a Proceedings Volume by
ELSEVIER/NORTH HOLLAND. Submitted papers will be refereed.
Instructions to Authors will be dispatched together with the
notification of acceptance of the abstract.
All articles should be submitted on or before the first day of the
conference!
CONFERENCE SECRETARIAT
P. SIFFERT, E-MRS 1994 SPRING MEETING, BP 20, 67037 Strasbourg
Cedex 2, France.
Phone: (33)88 10 65 43 - Fax: (33)88 10 62 93
EMail: UNAMUNO at FRCPN11
CONFERENCE LANGUAGE IS ENGLISH.
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EMAIL MESSAGE COMMUNICATED BY :PROF. PETER HESS <B95 at VM.UNI-HEIDELBERG.DE>
